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  • Hollow cathode plasma assisted atomic layer deposition of crystalline AlN, GaN, and Al_x Ga_(1-x) N thin films at low temperatures
  • Selective isolation of the electron or hole in photocatalysis: ZnO-TiO_2 and TiO_2-ZnO core-shell structured heterojunction nanofibers via electrospinning and atomic layer deposition

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